The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Nov. 18, 2011
Hiroki Yoshikawa, Niigata, JP;
Souichi Fukaya, Niigata, JP;
Yukio Inazuki, Niigata, JP;
Tsuneo Yamamoto, Niigata, JP;
Hideo Nakagawa, Niigata, JP;
Hiroki Yoshikawa, Niigata, JP;
Souichi Fukaya, Niigata, JP;
Yukio Inazuki, Niigata, JP;
Tsuneo Yamamoto, Niigata, JP;
Hideo Nakagawa, Niigata, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.