The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Mar. 02, 2010
Keiji Konno, Tokyo, JP;
Masato Tanaka, Tokyo, JP;
Momoko Ishii, Tokyo, JP;
Junichi Takahashi, Tokyo, JP;
Tomoki Nagai, Tokyo, JP;
Keiji Konno, Tokyo, JP;
Masato Tanaka, Tokyo, JP;
Momoko Ishii, Tokyo, JP;
Junichi Takahashi, Tokyo, JP;
Tomoki Nagai, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A),RRSi(OR)  (A)wherein Ris a monovalent organic group having at least one unsaturated bond, Rindividually represents a hydrogen atom, a halogen atom or a monovalent organic group, Rindividually represents a monovalent organic group, Ris a group other than OR, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.