The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2015

Filed:

Apr. 22, 2009
Applicants:

Christophe Borean, Le Touvet, FR;

Jean-luc Delcarri, Saint Ismier, FR;

Inventors:

Christophe Borean, Le Touvet, FR;

Jean-Luc Delcarri, Saint Ismier, FR;

Assignee:

Altatech Semiconductor, Montbonnot-Saint-Martin, FR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/50 (2006.01); C23C 16/503 (2006.01); C23C 16/505 (2006.01); C23C 16/509 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/22 (2006.01); C23C 16/06 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45565 (2013.01); C23C 16/4557 (2013.01); C23C 16/45574 (2013.01);
Abstract

Device for treating substrates, comprising a changer having controlled pressure and temperature, a substrate support which is provided in the chamber, the chamber comprising a gas inlet for carrying out a vapor phase deposition, and an upper wall of the chamber provided with a plurality of first channels connected to a first inlet and a plurality of second channels connected to a second inlet, the first and second channels opening into the chamber and being regularly distributed in the upper wall, a heating element provided above the upper wall and a gas discharge ring provided between the upper wall and the substrate support, the upper wall begin electrically conductive and insulated relative to the substrate support so as to be able to apply a voltage between the upper wall and the substrate support.


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