The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
Sep. 24, 2013
Globalfoundries Inc., Grand Cayman, KY;
Lei Yuan, Cupertino, CA (US);
Jongwook Kye, Pleasanton, CA (US);
Harry J. Levinson, Saratoga, CA (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
One method disclosed herein involves, among other things, identifying a plurality of features within an overall pattern layout that cannot be decomposed using the SADP process, wherein at least first and second adjacent features are required to be same-color features, decreasing a spacing between the first and second adjacent features such that the first feature and the second feature become different-color features so as to thereby render the plurality of features decomposable using the SADP process, decomposing the overall pattern layout into a mandrel mask pattern and a block mask pattern, and generating mask data sets corresponding to the mandrel mask pattern and the block mask pattern.