The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
Jun. 15, 2012
Alfredo Calvimontes, Dresden, DE;
Kay Lederer, Dresden, DE;
Alfredo Calvimontes, Dresden, DE;
Kay Lederer, Dresden, DE;
Leibniz-Institut fur Polymerforschung Dresden E.V., Dresden, DE;
Plastic Logic Limited, Cambridge, GB;
Abstract
The invention relates to the field of measurement technology and concerns a method and an apparatus, such as may be used, by way of example, in thin-layer technology for organic dielectric semi-conducting or conducting layers on substrates. The object of the invention is to indicate a method and an apparatus with which both the surface topography of the coating and that of the surface may be determined independently of one another, at the same position. The object is achieved by a method wherein the three-dimensional topography of the coating is determined using chromatic white light measurement and, subsequently, the thickness of the coating is determined using UV interferometry, and the surface topography of the coated surface is determined by a comparison with the overall dimensions of the coated surface. The object is further achieved by an apparatus wherein an apparatus for chromatic white light measurement and an apparatus for UV interferometry are disposed on a test bench.