The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Mar. 05, 2013
Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, Tokyo, JP;

Inventors:

Akira Yoshioka, Kanagawa, JP;

Yasunobu Saito, Tokyo, JP;

Hidetoshi Fujimoto, Kanagawa, JP;

Tetsuya Ohno, Kanagawa, JP;

Toshiyuki Naka, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/20 (2006.01); H01L 21/02 (2006.01); H01L 29/872 (2006.01); H01L 29/778 (2006.01); H01L 29/205 (2006.01); H01L 29/207 (2006.01); H01L 29/417 (2006.01);
U.S. Cl.
CPC ...
H01L 29/2003 (2013.01); H01L 21/02389 (2013.01); H01L 29/872 (2013.01); H01L 29/7787 (2013.01); H01L 29/205 (2013.01); H01L 29/207 (2013.01); H01L 29/417 (2013.01);
Abstract

According to one embodiment, a semiconductor device includes a first nitride semiconductor layer, a second nitride semiconductor layer, a third nitride semiconductor layer, an insulating film, an ohmic electrode, and a Schottky electrode. A surface region of the third nitride semiconductor layer between the ohmic electrode and the Schottky electrode contains an element heterogeneous with the constituent element of the third nitride semiconductor layer at a higher concentration than a region of the third nitride semiconductor layer of the second nitride semiconductor layer side.


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