The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
May. 14, 2012
Applicant:
Yu-shiang Yang, Tainan, TW;
Inventor:
Yu-Shiang Yang, Tainan, TW;
Assignee:
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
Abstract
A mask includes a substrate, at least a first strip pattern, at least a second strip pattern and an assist pattern. A width of the second strip pattern is substantially larger than a width of the first strip pattern. The assist pattern is disposed in the second strip pattern neighboring the first strip pattern, and the assist pattern does not overlap a center line of the second strip pattern.