The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2015

Filed:

Nov. 02, 2011
Applicants:

Shuangqi Dong, Matsudo, JP;

Norio Sato, Hitachiota, JP;

Susumu Koyama, Hitachinaka, JP;

Inventors:

Shuangqi Dong, Matsudo, JP;

Norio Sato, Hitachiota, JP;

Susumu Koyama, Hitachinaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H04N 5/217 (2011.01); H01J 37/22 (2006.01); G21K 7/00 (2006.01);
U.S. Cl.
CPC ...
H04N 5/217 (2013.01); H01J 37/222 (2013.01); H01J 37/26 (2013.01); H01J 2237/153 (2013.01);
Abstract

A charged particle microscope corrects distortion in an image caused by effects of drift in the sampling stage by measuring the correction reference image in a shorter time than the observation image, making corrections by comparing the shape of the observation image with the shape of the correction reference image, and reducing distortion in the observation images. The reference image for distortion correction is measured at the same position and magnification as when acquiring images for observation. In order to reduce effects from drift, the reference image is at this time measured within a shorter time than the essential observation image. The shape of the observation image is corrected by comparing the shapes of the reference image and observation image, and correcting the shape of the observation image to match the reference image.


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