The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2015

Filed:

Apr. 05, 2012
Applicants:

Mathew C. Schmidt, Santa Barbara, CA (US);

Kwang Choong Kim, Seoul, KR;

Hitoshi Sato, Kanagawa, JP;

Steven P. Denbaars, Goleta, CA (US);

James S. Speck, Goleta, CA (US);

Shuji Nakamura, Santa Barbara, CA (US);

Inventors:

Mathew C. Schmidt, Santa Barbara, CA (US);

Kwang Choong Kim, Seoul, KR;

Hitoshi Sato, Kanagawa, JP;

Steven P. DenBaars, Goleta, CA (US);

James S. Speck, Goleta, CA (US);

Shuji Nakamura, Santa Barbara, CA (US);

Assignees:

The Regents of the University of California, Oakland, CA (US);

Japan Science and Technology Agency, Kawaguchi, Saitama Prefecture, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/36 (2006.01); H01L 33/00 (2010.01); H01L 21/00 (2006.01); B82Y 20/00 (2011.01); H01L 21/02 (2006.01); H01S 5/343 (2006.01);
U.S. Cl.
CPC ...
H01L 33/0075 (2013.01); B82Y 20/00 (2013.01); H01L 21/0237 (2013.01); H01L 21/02389 (2013.01); H01L 21/02458 (2013.01); H01L 21/02507 (2013.01); H01L 21/0254 (2013.01); H01S 5/34333 (2013.01); H01S 2304/04 (2013.01);
Abstract

A method of device growth and p-contact processing that produces improved performance for non-polar III-nitride light emitting diodes and laser diodes. Key components using a low defect density substrate or template, thick quantum wells, a low temperature p-type III-nitride growth technique, and a transparent conducting oxide for the electrodes.


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