The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2015

Filed:

Jun. 07, 2012
Applicants:

Aurelie Marie Andree Brizard, Eindhoven, NL;

Sander Frederik Wuister, Eindhoven, NL;

Roelof Koole, Eindhoven, NL;

Emiel Peeters, Eindhoven, NL;

Inventors:

Aurelie Marie Andree Brizard, Eindhoven, NL;

Sander Frederik Wuister, Eindhoven, NL;

Roelof Koole, Eindhoven, NL;

Emiel Peeters, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/004 (2006.01); G03F 7/00 (2006.01); C30B 19/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); G03F 7/0002 (2013.01); C30B 19/00 (2013.01);
Abstract

A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.


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Brizard, Aurelie Marie Andree. (2015). Self-assemblable polymer and methods for use in lithography (U.S. Patent No. 8956804). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8956804

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