The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Feb. 14, 2013
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Inventor:
Kensuke Matsuzawa, Kawasaki, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/027 (2006.01); C08F 220/38 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C07C 69/54 (2006.01); C08F 220/14 (2006.01); C07C 69/757 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); G03F 7/20 (2013.01); C08F 220/38 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); C07C 69/54 (2013.01); C08F 220/14 (2013.01); H01L 21/0271 (2013.01); C07C 69/757 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); Y10S 430/114 (2013.01);
Abstract
A resist composition including a base component which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and an organic solvent component, the base component containing a resin component having a structural unit which generates acid, and the organic solvent component containing an organic solvent component including a compound represented by general formula (s-1) shown below in which X represents a single bond or an alkylene group of 1 to 3 carbon atoms; and n represents an integer of 0 to 3.