The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Jan. 02, 2013
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-sh, JP;
Hiroaki Shimizu, Kawasaki, JP;
Jiro Yokoya, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Hideto Nito, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
A method of forming a resist pattern, including: step (1) in which a resist composition containing a base component (A) that exhibits increased solubility in an alkali developing solution and a compound represented by general formula (C1) is applied to a substrate to form a resist film, step (2) in which the resist film is subjected to exposure, step (3) in which baking is conducted after step (2), and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern; and the resist composition used in step (1): wherein Rrepresents a group which forms an aromatic ring together with the two carbon atoms bonded to the Rgroup; Rrepresents a hydrogen atom or a hydrocarbon group; and Rrepresents a hydrogen atom, a carboxy group or a hydrocarbon group of 1 to 15 carbon atoms.