The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Sep. 07, 2012
Applicant:
Yoshihiko Nagata, Annaka, JP;
Inventor:
Yoshihiko Nagata, Annaka, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Chiyoda-Ku, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/64 (2012.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01); G03F 1/142 (2013.01);
Abstract
A pellicle is proposed wherein the mask-bonding agglutinant layer coated on one annular face of the pellicle frame is designed to have a cross-section which is trapezoidal (including the case of rectangle) so that the angle alpha (α) included between the side wall of the agglutinant layer and said annular face is 90 degrees or smaller.
Nagata, Yoshihiko. (2015). Pellicle for lithography and a method of making thereof (U.S. Patent No. 8956788). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8956788
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile