The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2015
Filed:
Aug. 31, 2010
Applicants:
Jianhui Wu, Ashland, MA (US);
Richard W. J. Hall, Southborough, MA (US);
Eric M. Schulz, Worcester, MA (US);
Srinivasan Ramanath, Holden, MA (US);
Inventors:
Jianhui Wu, Ashland, MA (US);
Richard W. J. Hall, Southborough, MA (US);
Eric M. Schulz, Worcester, MA (US);
Srinivasan Ramanath, Holden, MA (US);
Assignees:
Saint-Gobain Abrasives, Inc., Worcester, MA (US);
Saint-Gobain Abrasifs, Conflans-Sainte-Honorine, FR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B 53/00 (2006.01); B24B 53/007 (2006.01);
U.S. Cl.
CPC ...
B24B 53/007 (2013.01);
Abstract
A chemical mechanical polishing (CMP) conditioner includes a ceramic substrate having a major surface, and an abrasive coating overlying the major surface. The major surface can include micro-protrusions arranged in a curved pattern. Alternatively, the micro-protrusions can be arranged in an irregular pattern.