The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Nov. 23, 2010
Applicants:
Koji Hasegawa, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Taku Morisawa, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Takao Yoshihara, Joetsu, JP;
Inventors:
Koji Hasegawa, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Taku Morisawa, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Takao Yoshihara, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); C07C 69/73 (2006.01); C08F 220/22 (2006.01); C08F 220/24 (2006.01); C08F 220/26 (2006.01); C08F 222/18 (2006.01); C08F 222/22 (2006.01); C08L 33/14 (2006.01); C08K 5/36 (2006.01); C08L 33/16 (2006.01);
U.S. Cl.
CPC ...
C07C 69/73 (2013.01); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/26 (2013.01); C08F 222/18 (2013.01); C08F 222/22 (2013.01); C08L 33/14 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); C08K 5/36 (2013.01); C08L 33/16 (2013.01);
Abstract
A fluorinated monomer has formula (1) wherein Ris H, F, methyl or trifluoromethyl, Ris a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and kis 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.