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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8945809 B1

PDFFull Text
Date of Patent:
Feb. 03, 2015

Filed:

Nov. 23, 2010

Fluorinated monomer, fluorinated polymer, resist composition, and patterning process

Applicants:

Koji Hasegawa, Joetsu, JP;

Masayoshi Sagehashi, Joetsu, JP;

Taku Morisawa, Joetsu, JP;

Yuji Harada, Joetsu, JP;

Takao Yoshihara, Joetsu, JP;

Inventors:

Koji Hasegawa, Joetsu, JP;

Masayoshi Sagehashi, Joetsu, JP;

Taku Morisawa, Joetsu, JP;

Yuji Harada, Joetsu, JP;

Takao Yoshihara, Joetsu, JP;

Assignee:

Shin-Etsu Chemical Co., Ltd., Tokyo, JP;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Cynthia H Kelly

Assistant Examiner:

Anna Malloy

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); C07C 69/73 (2006.01); C08F 220/22 (2006.01); C08F 220/24 (2006.01); C08F 220/26 (2006.01); C08F 222/18 (2006.01); C08F 222/22 (2006.01); C08L 33/14 (2006.01); C08K 5/36 (2006.01); C08L 33/16 (2006.01);
U.S. Cl.
CPC ...
C07C 69/73 (2013.01); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/26 (2013.01); C08F 222/18 (2013.01); C08F 222/22 (2013.01); C08L 33/14 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); C08K 5/36 (2013.01); C08L 33/16 (2013.01);
Abstract

A fluorinated monomer has formula (1) wherein Ris H, F, methyl or trifluoromethyl, Ris a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and kis 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.

Find Patent Forward Citations

Hasegawa, Koji. (2015). Fluorinated monomer, fluorinated polymer, resist composition, and patterning process (U.S. Patent No. 8945809). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8945809

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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