The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Nov. 14, 2011
Applicants:
Faris Modawar, Woburn, MA (US);
Jeff Miller, Woburn, MA (US);
Mike Jura, Woburn, MA (US);
Brian Murphy, Woburn, MA (US);
Marcie Black, Woburn, MA (US);
Brent A. Buchine, Watertown, MA (US);
Inventors:
Faris Modawar, Woburn, MA (US);
Jeff Miller, Woburn, MA (US);
Mike Jura, Woburn, MA (US);
Brian Murphy, Woburn, MA (US);
Marcie Black, Woburn, MA (US);
Brent A. Buchine, Watertown, MA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/36 (2006.01); H01B 13/00 (2006.01); H01L 31/00 (2006.01); H01L 21/308 (2006.01); H01L 21/306 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
H01L 21/3086 (2013.01); H01L 21/30604 (2013.01); B82Y 10/00 (2013.01);
Abstract
A process is provided for etching a silicon-containing substrate. In the process, the surface of the substrate is cleaned. A film of alumina is deposited on the cleaned substrate surface. A silver film is deposited above the film of alumina. An etchant comprising HF is contacted with the silver film.