The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2015
Filed:
Sep. 05, 2013
Visera Technologies Company Limited, Hsinchu, TW;
Omnivision Technologies, Inc., Santa Clara, CA (US);
Ming-Kai Liu, Taipei County, TW;
Tzu-Wei Huang, Zhubei, TW;
Jui-Hung Chang, Hsinchu, TW;
Chia-Hui Huang, Hsinchu, TW;
Teng-Sheng Chen, Hsinchu, TW;
OmniVision Technologies, Inc., Santa Clara, CA (US);
VisEra Technologies Company Limited, Hsinchu, TW;
Abstract
A method for forming an image sensor device is provided. First, a lens is provided and a first sacrificial element is formed thereon. An electromagnetic interference layer is formed on the lens and the first sacrificial element, and the first sacrificial element and electromagnetic interference layer thereon are removed to form an electromagnetic interference pattern having an opening exposing a selected portion of the lens. A second sacrificial element is formed in the opening to cover a center region of the selected portion of the lens. A peripheral region of the selected portion of the lens remains exposed. A light-shielding layer is formed on the electromagnetic interference pattern, second sacrificial element, and peripheral region of the selected portion of the lens. The second sacrificial element and light-shielding pattern are removed to expose the center region of the selected portion of the lens as a light transmitting region.