The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2015
Filed:
Dec. 08, 2012
Carl Zeiss Microscopy Gmbh, Jena, DE;
Emmerich Bertagnolli, Vienna, AT;
Heinz Wanzenboeck, Vienna, AT;
Wolfram Buehler, Hermaringen, DE;
Camille Stebler, Fehren, CH;
Ulrike Zeile, Heidenheim, DE;
Alexander Rosenthal, Kempen, DE;
Carl Zeiss Microscopy GmbH, , DE;
Abstract
A processing system for processing an object () is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (), and a second energy beam, in particular an ion beam (), on a focusing region () in which a object () to be processed is arrangeable. A processing chamber wall () having two openings () for traversal of both energy beams and a connector () for supplying process gas delimits a processing chamber () from a vacuum chamber () of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.