The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2015
Filed:
Apr. 30, 2012
Vincent Sylvester Kuiper, The Hague, NL;
Erwin Slot, Zoetermeer, NL;
Marcel Nicolaas Jacobus Van Kervinck, The Hague, NL;
Guido DE Boer, Leerdam, NL;
Hendrik Jan DE Jong, The Hague, NL;
Vincent Sylvester Kuiper, The Hague, NL;
Erwin Slot, Zoetermeer, NL;
Marcel Nicolaas Jacobus Van Kervinck, The Hague, NL;
Guido De Boer, Leerdam, NL;
Hendrik Jan De Jong, The Hague, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N−1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit.