The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2015
Filed:
Jan. 19, 2009
Applicant:
Hiraku Ishikawa, Sendai, JP;
Inventor:
Hiraku Ishikawa, Sendai, JP;
Assignee:
Tokyo Electron Limited, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/56 (2006.01); H01L 21/314 (2006.01); C23C 16/26 (2006.01); H01L 21/67 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3146 (2013.01); C23C 16/26 (2013.01); C23C 16/56 (2013.01); H01L 21/67109 (2013.01); H01L 21/6719 (2013.01); H01L 21/67207 (2013.01); H01L 21/76807 (2013.01); H01L 21/76826 (2013.01); H01L 21/76828 (2013.01); H01L 21/76835 (2013.01); H01L 2221/1036 (2013.01);
Abstract
Functional groups on the outermost surface of an amorphous hydrocarbon film are substituted. The amorphous hydrocarbon film is formed on a silicon substrate Sub, which is coated with a low-k film. A heat treatment is performed on the amorphous hydrocarbon film in a non-silane gas atmosphere. Next, a heat treatment is performed on the amorphous hydrocarbon film in a silane gas atmosphere immediately after the heat treatment in a non-silane gas atmosphere. After the heat treatment, a film, such as a hard mask, is formed.