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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8932795 B1

PDFFull Text
Date of Patent:
Jan. 13, 2015

Filed:

May. 12, 2011

Resist composition, method of forming resist pattern, novel compound, and acid generator

Applicants:

Takehiro Seshimo, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Kazushige Dohtani, Kawasaki, JP;

Inventors:

Takehiro Seshimo, Kawasaki, JP;

Yoshiyuki Utsumi, Kawasaki, JP;

Kazushige Dohtani, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Cynthia H Kelly

Assistant Examiner:

Anna Malloy

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/20 (2006.01); C07D 333/52 (2006.01); C07D 333/76 (2006.01); C07D 493/18 (2006.01); C07D 497/08 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07D 333/52 (2013.01); C07D 333/76 (2013.01); C07D 493/18 (2013.01); C07D 497/08 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01);
Abstract

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula, Rrepresents a divalent aliphatic group of 3 to 20 carbon atoms; Rrepresents a monovalent aliphatic group of 3 to 20 carbon atoms having —C(═O)—O— or —S(═O)—; each of Rand Rindependently represents a divalent linking group; and Zrepresents a monovalent organic cation).

Find Patent Forward Citations

Seshimo, Takehiro. (2015). Resist composition, method of forming resist pattern, novel compound, and acid generator (U.S. Patent No. 8932795). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8932795

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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