The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Nov. 15, 2011
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Antonius Franciscus Johannes DE Groot, Someren, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Jeroen DE Boeij, Eindhoven, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;
Antonius Franciscus Johannes De Groot, Someren, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Jeroen De Boeij, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithography apparatus comprises a projection system arranged to transfer a pattern from a patterning device onto a substrate, a carrier, and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle moving parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier, the shuttle connector allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis and it is desirable if only one of the shuttle is connected to the carrier.