The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
May. 25, 2011
Doede Frans Kuiper, Eindhoven, NL;
Hans Butler, Best, NL;
Doede Frans Kuiper, Eindhoven, NL;
Hans Butler, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the device being capable of imparting the beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a stage system to position the table relative to a reference structure; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; an optical measurement system including a sensor part and an optical part, the optical part being configured to optically interact with the patterned radiation beam and to transmit a result from the interaction as output to the sensor part, wherein the optical part is arranged on the table, and the sensor part is arranged on the stage system or the reference structure.