The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
Apr. 29, 2010
Ivo Adam Johannes Thomas, Son, NL;
Siebe Landheer, Eindhoven, NL;
Arnout Johannes Meester, Eindhoven, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Gheorghe Tanasa, Eindhoven, NL;
Ivo Adam Johannes Thomas, Son, NL;
Siebe Landheer, Eindhoven, NL;
Arnout Johannes Meester, Eindhoven, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Gheorghe Tanasa, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.