The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
Jul. 07, 2008
Applicants:
Shou-wan Huang, Hsinchu, TW;
Kuan-hua Su, Hsinchu, TW;
Inventors:
Shou-Wan Huang, Hsinchu, TW;
Kuan-Hua Su, Hsinchu, TW;
Assignee:
United Microelectronics Corp., Science-Based Industrial Park, Hsinchu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/12 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01);
Abstract
A photoresist coating process including a first step and a second step is provided. In the first step, a wafer is accelerated by a first average acceleration. In the second step, the wafer is accelerated by a second average acceleration. The first acceleration and the second acceleration are both larger than zero, and photoresist material is provided to the wafer only in the second step.