The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2014

Filed:

Apr. 23, 2009
Applicants:

Olav Johannes Seijger, Eindhoven, NL;

Martinus Joseph Kok, Eindhoven, NL;

Sander Kerssemakers, Eindhoven, NL;

Inventors:

Olav Johannes Seijger, Eindhoven, NL;

Martinus Joseph Kok, Eindhoven, NL;

Sander Kerssemakers, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
G03F 7/707 (2013.01); H01L 21/68742 (2013.01);
Abstract

A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of the substrate support, and a second position, in which the lifting structure does not prevent the substrate from being supported by a support surface of the substrate support; wherein, in moving between the first and second positions, the substrate moves in a combination of movement substantially perpendicular to a plane parallel to the support surface and movement substantially parallel to the support surface.


Find Patent Forward Citations

Loading…