The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2014

Filed:

Mar. 18, 2014
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventors:

Josef Biberger, Wildenberg, DE;

Ralph Pulwey, Aalen, DE;

Andreas Adolf, Aalen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/14 (2006.01); H01J 3/26 (2006.01); H01J 37/147 (2006.01); H01J 37/28 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 3/26 (2013.01); H01J 37/1477 (2013.01); H01J 37/28 (2013.01); H01J 37/317 (2013.01); H01J 3/14 (2013.01); H01J 2237/303 (2013.01); H01J 2237/31749 (2013.01);
Abstract

An ion beam system comprises a voltage supply systemand at least one beam deflectorhaving at least one first deflection electrodeand plural second deflection electrodes, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.


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