The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2014
Filed:
Mar. 06, 2013
International Business Machines Corporation, Armonk, NY (US);
Vamsi Devarapalli, Wappingers Falls, NY (US);
Colin J. Goyette, Red Hook, NY (US);
Michael R. Kennett, Poughkeepsie, NY (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Qinghuang Lin, Yorktown Heights, NY (US);
James J. Steffes, Poughkeepsie, NY (US);
Adam D. Ticknor, Wappingers Falls, NY (US);
Wei-tsu Tseng, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A post metal chemical-mechanical planarization (CMP) cleaning process for advanced interconnect technology is provided. The process, which follows CMP, combines an acidic clean and a basic clean in sequence. The process can achieve a more than 60% reduction in CMP defects, such as polish residues, foreign materials, slurry abrasives, scratches, and hollow metal, relative to an all-basic clean process. The process also eliminates the circular ring defects that occur intermittently during roller brush cleans within a roller brush clean module.