The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Jan. 28, 2013
Jung-chan Lee, Gyeonggi-do, KR;
Seung-jae Lee, Gyeonggi-do, KR;
Sang-bom Kang, Seoul, KR;
Dae-young Kwak, Gyeonggi-do, KR;
Myeong-cheol Kim, Gyeonggi-do, KR;
Yong-ho Jeon, Gyeonggi-do, KR;
Jung-Chan Lee, Gyeonggi-do, KR;
Seung-Jae Lee, Gyeonggi-do, KR;
Sang-Bom Kang, Seoul, KR;
Dae-Young Kwak, Gyeonggi-do, KR;
Myeong-Cheol Kim, Gyeonggi-do, KR;
Yong-Ho Jeon, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;
Abstract
A semiconductor device including: a first gate pattern disposed in a peripheral region of a substrate; a second gate pattern disposed in a cell region of the substrate; a first insulator formed on sidewalls of the first gate pattern; and a second insulator formed on sidewalls of the second gate pattern, wherein a dielectric constant of the first insulator is different from a dielectric constant of the second insulator, and wherein a height of the second insulator is greater than a height of the second gate pattern.