The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Dec. 07, 2011
Ming-shiou Kuo, Taichung, TW;
Chih-tsung Lee, Hsinchu, TW;
You-hua Chou, Taipei, TW;
Ming-chin Tsai, Hsin-Chu, TW;
Chia-ho Chen, Zhubei, TW;
Chin-hsiang Lin, Hsin-Chu, TW;
Ming-Shiou Kuo, Taichung, TW;
Chih-Tsung Lee, Hsinchu, TW;
You-Hua Chou, Taipei, TW;
Ming-Chin Tsai, Hsin-Chu, TW;
Chia-Ho Chen, Zhubei, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides for methods and systems for controlling profile uniformity of a chemical vapor deposition (CVD) film. A method includes depositing a first layer on a substrate by CVD with a first shower head, the first layer having a first profile, and depositing a second layer over the first layer by CVD with a second shower head, the second layer having a second profile. The combined first layer and second layer have a third profile, and the first profile, the second profile, and the third profile are different from one another.