The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2014

Filed:

Mar. 13, 2013
Applicant:

Nuflare Technology, Inc., Shizuoka, JP;

Inventors:

Kentaro Omi, Shizuoka, JP;

Michihiro Kawaguchi, Shizuoka, JP;

Keisuke Yamaguchi, Shizuoka, JP;

Assignee:

NuFlare Technology, Inc., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); H01J 37/22 (2006.01); H01J 37/317 (2006.01); H01J 37/304 (2006.01);
U.S. Cl.
CPC ...
H01J 37/22 (2013.01); H01J 2237/31776 (2013.01); H01J 2237/2482 (2013.01); H01J 37/3174 (2013.01); H01J 37/3045 (2013.01);
Abstract

A charged particle beam writing apparatus according to an embodiment, includes a laser displacement meter configured to measure a position of a substrate to be written; a correction unit configured to correct a misregistration amount of the position of the substrate measured by the laser displacement meter from a reference position of the substrate; and a writing unit configured to write a pattern onto the substrate corrected for the misregistration amount by using a charged particle beam.


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