The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2014

Filed:

Jul. 09, 2012
Applicants:

Chien M. Wai, Moscow, ID (US);

Hiroyuki Ohde, Higashi-Hiroshima, JP;

Stephen J. Kramer, Boise, ID (US);

Inventors:

Chien M. Wai, Moscow, ID (US);

Hiroyuki Ohde, Higashi-Hiroshima, JP;

Stephen J. Kramer, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/12 (2006.01); C23C 16/40 (2006.01); B01J 13/00 (2006.01); C23C 18/00 (2006.01); H01L 21/316 (2006.01);
U.S. Cl.
CPC ...
H01L 21/316 (2013.01); C23C 18/1208 (2013.01); C23C 18/122 (2013.01); C23C 18/00 (2013.01);
Abstract

Methods of increasing the solubility of a base in supercritical carbon dioxide include forming a complex of a Lewis acid and the base, and dissolving the complex in supercritical carbon dioxide. The Lewis acid is soluble in supercritical carbon dioxide, and the base is substantially insoluble in supercritical carbon dioxide. Methods for increasing the solubility of water in supercritical carbon dioxide include dissolving an acid or a base in supercritical carbon dioxide to form a solution and dissolving water in the solution. The acid or the base is formulated to interact with water to solubilize the water in the supercritical carbon dioxide. Some compositions include supercritical carbon dioxide, a hydrolysable metallic compound, and at least one of an acid and a base. Some compositions include an alkoxide and at least one of an acid and a base.


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