The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2014

Filed:

Mar. 23, 2011
Applicants:

Nicholas P. T. Bateman, Reading, MA (US);

William T. Weaver, Austin, TX (US);

Paul Sullivan, Wenham, MA (US);

John W. Graff, Swampscott, MA (US);

Inventors:

Nicholas P. T. Bateman, Reading, MA (US);

William T. Weaver, Austin, TX (US);

Paul Sullivan, Wenham, MA (US);

John W. Graff, Swampscott, MA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/265 (2006.01); H01L 31/0224 (2006.01); H01L 21/266 (2006.01); H01L 31/18 (2006.01); H01L 31/068 (2012.01);
U.S. Cl.
CPC ...
H01L 21/266 (2013.01); Y02E 10/547 (2013.01); H01L 31/022441 (2013.01); H01L 31/1804 (2013.01); H01L 31/0682 (2013.01);
Abstract

Methods to form complementary implant regions in a workpiece are disclosed. A mask may be aligned with respect to implanted or doped regions on the workpiece. The mask also may be aligned with respect to surface modifications on the workpiece, such as deposits or etched regions. A masking material also may be deposited on the implanted regions using the mask. The workpiece may be a solar cell.


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