The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Jul. 13, 2013
Carl Zeiss Microimaging Gmbh, Jena, DE;
Michael Goelles, Jena, DE;
Ralf Netz, Jena, DE;
Frank Hecht, Weimar, DE;
Joerg-Michael Funk, Jena, DE;
Carl Zeiss Microscopy GmbH, Jena, DE;
Abstract
Laser scanning microscope and its operating method in which at least two first and second light distributions activated independently of each other and that can move in at least one direction illuminate a sample with the help of a beam-combining element, and the light is detected by the sample as it comes in, characterized by the fact that the scanning fields created by the light distributions on the sample are made to overlap mutually such that a reference pattern is created on the sample with one of the light distributions, which is then captured and used to create the overlap with the help of the second light distribution (correction values are determined) and/or a reference pattern arranged in the sample plane or in an intermediate image plane is captured by both scanning fields and used to create the overlap (correction values are determined) and/or structural characteristics of the sample are captured by the two scanning fields as reference pattern and used to create the overlap in which correction values are determined.