The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Jan. 30, 2013
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Markus Goeppert, Karlsruhe, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A method for qualifying optics () of a projection exposure tool () for microlithography. The optics include () at least one mirror element (-to--to-) with a reflective coating () disposed on the latter. The method includes: irradiating electromagnetic radiation () of at least two different wavelengths onto the optics (), a penetration depth of the radiation into the coating () of the mirror element varying between the individual wavelengths, taking an optical measurement on the optics () for each of the wavelengths, and evaluating the measurement results for the different wavelengths taking into consideration a respective penetration depth of the radiation into the coating () of the mirror element for each of the different wavelengths.