The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Jan. 04, 2012
Source/drain zones with a delectric plug over an isolation region between active regions and methods
John Hopkins, Boise, ID (US);
James Mathew, Boise, ID (US);
Jie Sun, Boise, ID (US);
Gordon Haller, Boise, ID (US);
John Hopkins, Boise, ID (US);
James Mathew, Boise, ID (US);
Jie Sun, Boise, ID (US);
Gordon Haller, Boise, ID (US);
Micron Technology, Inc, Boise, ID (US);
Abstract
Devices, memory arrays, and methods are disclosed. In an embodiment, one such device has a source/drain zone that has first and second active regions, and an isolation region and a dielectric plug between the first and second active regions. The dielectric plug may extend below upper surfaces of the first and second active regions and may be formed of a dielectric material having a lower removal rate than a dielectric material of the isolation region for a particular isotropic removal chemistry.