The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2014

Filed:

Feb. 13, 2009
Applicants:

Rainer Knippelmeyer, Munich, DE;

Nicholas Economou, Lexington, MA (US);

Mohan Ananth, Boxborough, MA (US);

Lewis A. Stern, Hollis, NH (US);

Bill Dinatale, Bedford, MA (US);

Lawrence Scipioni, Bedford, MA (US);

John A. Notte, Iv, Gloucester, MA (US);

Inventors:

Rainer Knippelmeyer, Munich, DE;

Nicholas Economou, Lexington, MA (US);

Mohan Ananth, Boxborough, MA (US);

Lewis A. Stern, Hollis, NH (US);

Bill DiNatale, Bedford, MA (US);

Lawrence Scipioni, Bedford, MA (US);

John A. Notte, IV, Gloucester, MA (US);

Assignee:

Carl Zeiss Microscopy, LLC, Thornwood, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); G01N 1/32 (2006.01);
U.S. Cl.
CPC ...
G01N 1/32 (2013.01); H01J 2237/0203 (2013.01); H01J 2237/31749 (2013.01); H01J 2237/0807 (2013.01);
Abstract

Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface.


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