The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
May. 17, 2012
Yu-mei Liu, Hsinchu, TW;
Chin-hsiang Lin, Hsin-chu, TW;
Heng-hsin Liu, New Taipei, TW;
Heng-jen Lee, Baoshan Township, Hsinchu County, TW;
I-hsiung Huang, Hsinchu County, TW;
Chih-wei Lin, Hsinchu, TW;
Yu-Mei Liu, Hsinchu, TW;
Chin-Hsiang Lin, Hsin-chu, TW;
Heng-Hsin Liu, New Taipei, TW;
Heng-Jen Lee, Baoshan Township, Hsinchu County, TW;
I-Hsiung Huang, Hsinchu County, TW;
Chih-Wei Lin, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method and system to improve scanner throughput is provided. An image from a reticle is projected onto a substrate using a continuous linear scanning procedure in which an entire column of die or cells of die is scanned continuously, i.e. without stepping to a different location. Each scan includes translating a substrate with respect to a fixed beam. While the substrate is translated, the reticle is also translated. When a first die or cell of die is projected onto the substrate, the reticle translates along a direction opposite the scan direction and as the scan continues along the same direction, the reticle then translates in the opposite direction of the substrate thereby forming an inverted pattern on the next die or cell. The time associated with exposing the substrate is minimized as the stepping operation only occurs after a complete column of cells is scanned.