The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
May. 10, 2011
Applicants:
Toru Kitada, Burnsville, MN (US);
Naoki Watanabe, Kawasaki, JP;
Motonobu Nagai, Machida, JP;
Inventors:
Assignee:
Canon Anelva Corporation, Kawasaki-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01); H01F 41/18 (2006.01); B82Y 25/00 (2011.01); C23C 14/34 (2006.01); C23C 14/54 (2006.01); H01J 37/34 (2006.01); H01F 10/32 (2006.01); H01L 43/12 (2006.01);
U.S. Cl.
CPC ...
H01F 41/18 (2013.01); B82Y 25/00 (2013.01); C23C 14/34 (2013.01); C23C 14/3464 (2013.01); C23C 14/54 (2013.01); H01J 37/3417 (2013.01); H01J 37/3447 (2013.01); H01J 37/3452 (2013.01); H01J 37/3455 (2013.01); H01J 37/3476 (2013.01); H01F 10/3254 (2013.01); H01L 43/12 (2013.01);
Abstract
A sputtering apparatus includes a substrate holder which holds a substrate to be rotatable in the plane direction of the processing surface of the substrate, a substrate-side magnet which is arranged around the substrate and forms a magnetic field on the processing surface of the substrate, a cathode which is arranged diagonally above the substrate and receives discharge power, a position detection unit which detects the rotational position of the substrate, and a controller which controls the discharge power in accordance with the rotational position detected by the position detection unit.