The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Mar. 02, 2011
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Michel Riepen, Veldhoven, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Ralph Joseph Meijers, Kerkrade, NL;
Fabrizio Evangelista, Eindhoven, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Michel Riepen, Veldhoven, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Ralph Joseph Meijers, Kerkrade, NL;
Fabrizio Evangelista, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps.