The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Jun. 01, 2012
Kun-ei Chen, Beimen Township, Tainan County, TW;
Jen-yi Chen, Linnei Township, Yunlin County, TW;
Yi-chung Lin, Tainan, TW;
Chen-chieh Chiang, Kaohsiung, TW;
Ling-sung Wang, Tainan, TW;
Kun-Ei Chen, Beimen Township, Tainan County, TW;
Jen-Yi Chen, Linnei Township, Yunlin County, TW;
Yi-Chung Lin, Tainan, TW;
Chen-Chieh Chiang, Kaohsiung, TW;
Ling-Sung Wang, Tainan, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method of semiconductor processing comprises providing a semiconductor wafer in a processing chamber; feeding at least one tungsten-containing precursor in a gas state into the processing chamber for atomic layer deposition (ALD) of tungsten; feeding at least one reducing chemical in a gas state into the processing chamber; and monitoring a concentration of at least one gaseous byproduct in the chamber; and providing a signal indicating concentration of the at least one gaseous byproduct in the chamber. The byproduct is produced by a reaction between the at least one tungsten-containing precursor and the at least one reducing chemical during the ALD.