The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2014

Filed:

Jan. 10, 2013
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Yoshiyuki Utsumi, Kawasaki, JP;

Hiroaki Shimizu, Kawasaki, JP;

Jiro Yokoya, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 309/06 (2006.01); C07C 309/17 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); G03F 7/0045 (2013.01); C07C 309/06 (2013.01); C07C 309/17 (2013.01);
Abstract

A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, Rrepresents H, OH, halogen atom, alkoxy group, hydrocarbon group or nitro group; m represents 0-4; n represents 0-3; Rx represents H or hydrocarbon group; Xrepresents divalent linking group; Xrepresents H or hydrocarbon group; Y represents single bond or C(O); A represents alkylene group which may be substituted with oxygen atom, carbonyl group or alkylene group which may have fluorine atom; Qand Qrepresents F or fluorinated alkyl group; and Wrepresents primary, secondary or tertiary ammonium coutercation which exhibits pKa smaller than pKa of HN(X)—X—Y—O-A-C(Q)(Q)—SOgenerated by decomposition upon exposure].


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