The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2014

Filed:

Dec. 14, 2012
Applicant:

Intermolecular, Inc., San Jose, CA (US);

Inventors:

Guowen Ding, San Jose, CA (US);

Mohd Fadzli Anwar Hassan, San Francisco, CA (US);

Minh Huu Le, San Jose, CA (US);

Zhi-Wen Sun, Sunnyvale, CA (US);

Yu Wang, San Jose, CA (US);

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/14 (2006.01); C23C 14/18 (2006.01); C23C 14/34 (2006.01); C01B 35/10 (2006.01); B05D 5/06 (2006.01); G02B 1/11 (2006.01);
U.S. Cl.
CPC ...
B05D 5/061 (2013.01); C23C 14/34 (2013.01); G02B 1/113 (2013.01); C01B 35/10 (2013.01); C23C 14/18 (2013.01); C23C 14/14 (2013.01);
Abstract

A method for forming boron oxide films formed using reactive sputtering. The boron oxide films are candidates as an anti-reflection coating. Boron oxide films with a refractive index of about 1.38 can be formed. The boron oxide films can be formed using power densities between 2 W/cmand 11 W/cmapplied to the target. The oxygen in the reactive sputtering atmosphere can be between 40 volume % and 90 volume %.


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