The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Dec. 13, 2011
Guido DE Boer, Leerdam, NL;
Hendrik Jan DE Jong, Den Haag, NL;
Vincent Sylvester Kuiper, Den Haag, NL;
Erwin Slot, Zoetermeer, NL;
Guido De Boer, Leerdam, NL;
Hendrik Jan De Jong, Den Haag, NL;
Vincent Sylvester Kuiper, Den Haag, NL;
Erwin Slot, Zoetermeer, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area.