The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Nov. 13, 2009
Applicants:
Maria Peter, Eindhoven, NL;
Erwin Rinaldo Meinders, Veldhoven, NL;
Inventors:
Maria Peter, Eindhoven, NL;
Erwin Rinaldo Meinders, Veldhoven, NL;
Assignee:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); B82Y 40/00 (2011.01); B82Y 10/00 (2011.01); G03F 7/00 (2006.01); B29C 59/02 (2006.01); B29C 35/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 2059/023 (2013.01); B29C 59/022 (2013.01); B82Y 40/00 (2013.01); B82Y 10/00 (2013.01); B29C 2035/0827 (2013.01);
Abstract
The invention relates to a methodfor forming a multi-level surface on a substrate, wherein said surface comprises areas of different wettability, the method comprising the step (A, B) of applying a multi-level stamp to the substrate for forming the multi-level surface, said multi-level stamp having different structural regionsarranged along the multi-level surface for locally altering wettability properties of at least a portion of a level of the multi-level surface. The invention further relates to a semiconductor device and a method for manufacturing a semiconductor device.