The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2014

Filed:

Jun. 06, 2012
Applicants:

Adam R Hall, Clemmons, NC (US);

Jijin Yang, Acton, MA (US);

David C Ferranti, Concord, MA (US);

Colin a Sanford, Atkinson, NH (US);

Inventors:

Adam R Hall, Clemmons, NC (US);

Jijin Yang, Acton, MA (US);

David C Ferranti, Concord, MA (US);

Colin A Sanford, Atkinson, NH (US);

Assignees:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G01N 23/02 (2006.01); H01J 37/30 (2006.01); H01J 37/305 (2006.01); H01J 37/26 (2006.01); G01N 15/10 (2006.01); G01N 15/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3056 (2013.01); H01J 37/261 (2013.01); G01N 15/10 (2013.01); G01N 2015/0065 (2013.01); Y10S 977/924 (2013.01);
Abstract

In one aspect, methods of nanopore formation in solid state membranes are described herein, In some embodiments, a method of forming an aperture comprises providing at least one solid state membrane in a chamber, selecting a first dose of ions sufficient to provide a first aperture of predetermined diameter through the membrane and exposing a surface of the membrane at a first location to the first dose of ions in a focused ion beam having a focal point of diameter less than or equal to about 1 nm to remove material from the membrane at the first location thereby providing the first aperture having the predetermined diameter or substantially the predetermined diameter.


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