The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Apr. 27, 2011
Applicant:
Anh Duong, Fremont, CA (US);
Inventor:
Anh Duong, Fremont, CA (US);
Assignee:
Intermolecular, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 7/26 (2006.01); C11D 7/34 (2006.01); C11D 7/50 (2006.01); H01L 21/285 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C11D 7/3209 (2013.01); C11D 7/263 (2013.01); C11D 7/3218 (2013.01); C11D 7/34 (2013.01); C11D 7/5013 (2013.01); C11D 7/5022 (2013.01); H01L 21/28518 (2013.01); H01L 21/02068 (2013.01);
Abstract
A composition of matter and method to remove excess material during the manufacturing of semiconductor devices includes providing a substrate; applying a metal chelator mixture to the substrate, where the metal chelator mixture comprising a metal chelator and a solvent, where the metal chelator binds to the platinum residue, to render the platinum residue soluble; and rinsing the metal chelator mixture from the substrate to remove the platinum residue from the silicide.