The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Jul. 29, 2010
Applicants:

Hideki Hirotsuru, Fukuoka, JP;

Yosuke Ishihara, Fukuoka, JP;

Hideo Tsukamoto, Fukuoka, JP;

Inventors:

Hideki Hirotsuru, Fukuoka, JP;

Yosuke Ishihara, Fukuoka, JP;

Hideo Tsukamoto, Fukuoka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/60 (2010.01); C04B 41/52 (2006.01); C04B 35/565 (2006.01); C22C 29/06 (2006.01); C22C 26/00 (2006.01); C22C 1/10 (2006.01); C04B 41/00 (2006.01); C04B 35/52 (2006.01); C22C 29/16 (2006.01); C04B 41/90 (2006.01); H01L 33/00 (2010.01); H01L 33/64 (2010.01);
U.S. Cl.
CPC ...
C04B 35/565 (2013.01); B22F 2998/10 (2013.01); H01L 33/0079 (2013.01); C04B 41/52 (2013.01); C04B 2235/427 (2013.01); C04B 2235/5436 (2013.01); H01L 33/641 (2013.01); C04B 2235/5472 (2013.01); C22C 29/065 (2013.01); H01L 33/60 (2013.01); C22C 26/00 (2013.01); C04B 2235/3826 (2013.01); C22C 1/1094 (2013.01); C04B 41/009 (2013.01); C04B 35/52 (2013.01); C22C 29/16 (2013.01); C22C 1/1036 (2013.01); C04B 2235/5427 (2013.01); C04B 41/90 (2013.01);
Abstract

Provided is a wafer for LED mounting having a small difference in thermal expansion coefficient from an LED and having excellent heat conductivity, a method for manufacturing the wafer for LED mounting, and an LED-mounted structure manufactured by using the wafer for LED mounting. The wafer for LED mounting () is constituted of a metal infiltrated ceramic composite () and a protective layer () that is formed therearound. The metal infiltrated ceramic composite () preferably has a thin metal layer () on a surface thereof. The method for manufacturing the wafer is characterized by comprising filling at least one selected from the group consisted of porous ceramic bodies, ceramic powder compacts and ceramic powders into a tubular body made of metal or ceramic, then impregnating a metal into the void of at least one selected from the group consisted of porous ceramic bodies, ceramic powder compacts and ceramic powders, and thereafter performing a process.


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