The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Apr. 09, 2013
Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Torahiko Yamaguchi, Tokyo, JP;

Seiichirou Takahashi, Tokyo, JP;

Hiroyuki Ishii, Tokyo, JP;

Katsumi Inomata, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 145/00 (2006.01); H01L 21/306 (2006.01); H01L 29/02 (2006.01); C09J 123/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/306 (2013.01); C09D 145/00 (2013.01); H01L 29/02 (2013.01); C09J 123/00 (2013.01);
Abstract

The invention provides a substrate treating method which can favorably prevent damages to a substrate when the substrate is separated from a support, thus achieving a high yield. The substrate treating method includes, in the sequence set forth, a stepof temporarily fixing a substrate onto a support via a temporary fixing material to form a stack, the temporary fixing material including at least a temporary fixing material (I) containing a cycloolefin polymer (A) and a compound (B) having a structure (b1) such as a dialkyl silicone structure, and a structure (b2) such as a polyoxyalkylene structure, a stepof processing the substrate and/or transporting the stack, and a stepof applying a force to the substrate or the support in a direction substantially perpendicular to the plane of substrate to separate the substrate from the support.


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