The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2014
Filed:
Sep. 24, 2013
Toru Tsuchihashi, Shizuoka, JP;
Tadateru Yatsuo, Shizuoka, JP;
Koutarou Takahashi, Shizuoka, JP;
Tomotaka Tsuchimura, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Tadateru Yatsuo, Shizuoka, JP;
Koutarou Takahashi, Shizuoka, JP;
Tomotaka Tsuchimura, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A resist pattern forming method contains: in the following order, (1) forming a resist film by using a negative chemical amplification resist composition containing (A) a polymer compound having a repeating unit represented by formula (1) as defined in the specification, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a crosslinking agent capable of crosslinking the polymer compound (A) by an action of an acid; (2) exposing the resist film, so as to form an exposed resist film; and (4) developing the exposed resist film by using a developer containing an organic solvent.